Canyon Materials, Inc. - Calibration Plates














Calibration Plate I85 (continued)


Group5:  6 blaze gratings having periods of 10µm, 20µm to 60µm:  Each grating has 4 periods, and has 20 gray levels in each period.  D = 0.12 + 0.0526i, where i = 0, 1, 2 . . . . . 19.
Group 6: 6 blaze gratings having periods of 50µm, 100µm, 200µm, 300µm, 400µm, and 500µm:  Each grating has 4 periods, and has 100 gray levels in each period.  D = 0.12 + 0.0101i, where i = 0, 1, 2 . . . . . 99.
Part III: With this portion of the calibration plate, HEBS-glass users can determine the optical density (OD) range of a gray scale mask that is most appropriate for a particular device fabricated with existing in-house processes and equipment for photolithography and ion beam etching.  This part contains two sets of test patterns that are arranged as follows:

Each of the two test patterns has nine optical density ranges.  There are 20 gray levels within each of the nine optical density ranges.  Within the test pattern on the left, the 20 OD values in each of the nine ranges vary in intervals of constant delta OD.  The test pattern on the right has the same optical density ranges but vary in intervals of a constant delta T. 

Each test pattern is composed of a 9x9 array of via structures that are 800 microns in length (See Diagram I).  The OD range is consistent across a row, whereas the width and gap of the via structure is consistent down a column.  Table I exhibits the values of minimum and maximum ODs within each of the nine OD ranges.  Table II displays the dimensions of the via structures within a column.  Diagram 2 defines the via gap and via width.  Note that when the via gap is 0 µm, the via structure is actually a V-groove

For more detailed reference, the OD values corresponding to the twenty gray levels in each of the nine rows for test patterns of constant delta OD is listed in Table III.  Similarly, the OD values of the twenty gray levels in each of the nine rows for test patterns of constant delta T is listed in Table IV.
 

Instructions for viewing mask patterns under an optical microscope:  Please view mask patterns in the HEBS-glass under a microscope in transmission mode (i.e. using the bottom light);  the mask pattern has little or no contrast in a reflection mode (i.e. using the top light) because the reflectance of HEBS-glass is 4% in both clear and e-beam darkened areas.

Instructions for handling and storage:  Since the mask pattern is inside the glass, HEBS-glass masks can be washed like a quartz glass substrate, using any solvent or acid (except HF).  HEBS-glass masks should be kept at room temperature.  Humidity levels from 0 to 100% do not affect HEBS-glass masks. 
 

Diagram 1.  Layout of one test pattern

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