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Calibration Plate I85 P+N(continued)
Part VIII:
Four arrays of refractive microlenses: Two arrays each of circular lenslets and square lenslets written with 67 graylevels in two optical density ranges. The circular lenslets are 134 microns in diameter. The square lenslets are 284 micron x 284 micron. The two optical density ranges are 1.265 to 0.261 and 1.980 to 0.424. If the ODmax of the exemplary OD ranges is too high for your photoresist or grayscale photolithography process, you would get flat top lenses. You can overcome this problem simply by lowering the value of ODmax in grayscale masks of your lens design.
Part IX:
Positive and Negative refractive lens arrays. The description of the following lens arrays A, B, C, and D assumes the use of a positive photoresist.
|
|
Lens |
Min OD |
Max OD |
|
A circular, positive |
0.284 |
2.067 |
|
B circular, negative |
0.279 |
2.006 |
|
C square, positive |
0.284 |
2.006 |
|
D square, negative |
0.279 |
2.005 |
Part X:
This part consists of 9 x 10 variations of gratings. The grating pitch and the optical density range are the variable parameters. With this portion of the calibration plate, HEBS-glass users can determine the optical density (OD) range of a custom gray scale mask as well as the gray level widths that are most appropriate for a particular device to be fabricated using existing in-house processes and equipment for photolithography and RIE or ICP etching. In the 9 x 10 variations of gratings, there are 9 variations of grating pitches and 10 variations of optical density ranges.
The 9 grating pitches are 4mm, 6mm, 8mm,10mm, 16mm, 20mm, 30mm, 40mm, and 400mm. There are 20 gray levels within every grating pitch
The table below lists the Optical Density values of the 20 gray levels (0 to 19) within a grating pitch in each of the 10 optical density ranges.
|
LAYER |
OD Ranges |
|
1 |
2 |
3 |
4 |
5 |
6 |
7 |
8 |
9 |
10 |
|
0 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
0.284 |
|
1 |
0.300 |
0.305 |
0.310 |
0.316 |
0.326 |
0.337 |
0.347 |
0.358 |
0.368 |
0.374 |
|
2 |
0.316 |
0.326 |
0.337 |
0.347 |
0.368 |
0.389 |
0.410 |
0.431 |
0.452 |
0.465 |
|
3 |
0.331 |
0.347 |
0.363 |
0.379 |
0.410 |
0.442 |
0.473 |
0.505 |
0.537 |
0.555 |
|
4 |
0.347 |
0.368 |
0.389 |
0.410 |
0.452 |
0.495 |
0.537 |
0.579 |
0.621 |
0.645 |
|
5 |
0.363 |
0.389 |
0.416 |
0.442 |
0.495 |
0.547 |
0.600 |
0.652 |
0.705 |
0.736 |
|
6 |
0.379 |
0.410 |
0.442 |
0.473 |
0.537 |
0.600 |
0.663 |
0.726 |
0.789 |
0.826 |
|
7 |
0.395 |
0.431 |
0.468 |
0.505 |
0.579 |
0.652 |
0.726 |
0.800 |
0.873 |
0.916 |
|
8 |
0.410 |
0.452 |
0.495 |
0.537 |
0.621 |
0.705 |
0.789 |
0.873 |
0.958 |
1.007 |
|
9 |
0.426 |
0.473 |
0.521 |
0.568 |
0.663 |
0.758 |
0.852 |
0.947 |
1.042 |
1.097 |
|
10 |
0.442 |
0.495 |
0.547 |
0.600 |
0.705 |
0.810 |
0.916 |
1.021 |
1.126 |
1.187 |
|
11 |
0.458 |
0.516 |
0.573 |
0.631 |
0.747 |
0.863 |
0.979 |
1.095 |
1.210 |
1.277 |
|
12 |
0.473 |
0.537 |
0.600 |
0.663 |
0.789 |
0.916 |
1.042 |
1.168 |
1.295 |
1.368 |
|
13 |
0.489 |
0.558 |
0.626 |
0.695 |
0.831 |
0.968 |
1.105 |
1.242 |
1.379 |
1.458 |
|
14 |
0.505 |
0.579 |
0.652 |
0.726 |
0.873 |
1.021 |
1.168 |
1.316 |
1.463 |
1.548 |
|
15 |
0.521 |
0.600 |
0.679 |
0.758 |
0.916 |
1.073 |
1.231 |
1.389 |
1.547 |
1.639 |
|
16 |
0.537 |
0.621 |
0.705 |
0.789 |
0.958 |
1.126 |
1.295 |
1.463 |
1.631 |
1.729 |
|
17 |
0.552 |
0.642 |
0.731 |
0.821 |
1.000 |
1.179 |
1.358 |
1.537 |
1.716 |
1.819 |
|
18 |
0.568 |
0.663 |
0.758 |
0.852 |
1.042 |
1.231 |
1.421 |
1.610 |
1.800 |
1.910 |
|
19 |
0.584 |
0.684 |
0.784 |
0.884 |
1.084 |
1.284 |
1.484 |
1.684 |
1.884 |
2.000 |
Instructions for viewing mask patterns under an optical microscope: Please view mask patterns in the HEBS-glass under a microscope in a transmission mode (i.e. using the bottom light); the mask pattern has little or no contrast in a reflection mode (i.e. using the top light) because the reflectance of HEBS-glass is about 4% in both clear and e-beam darkened areas.
Instructions for handling and storage: Since the mask pattern is inside the glass, HEBS-glass masks can be washed like a quartz glass substrate, using any solvent or acid (except HF). Strong base solution may cause pits in the surface of HEBS-Glass or any silicate glass. HEBS-Glass masks should be kept at room temperature or lower temperatures. Humidity levels from 0 to 100% do not affect HEBS-glass masks.
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