HEBS Glass Gray Scale Lithography (CMI Product Information No. 01-88)
Canyon Materials, Inc. specializes in the fabrication
of true gray-level masks. With its revolutionary, patented High Energy Beam
Sensitive (HEBS) glass, CMI fabricates a true gray-level (gray-scale)
mask using a standard e-beam pattern generator. HEBS-glass turns dark instantaneously
upon exposure to an electron beam; the more electron dosage (current × dwell time), the darker
the glass gets, without graininess. Since there is no graininess, HEBS-glass
is capable of resolution to molecular dimensions.
Since an electron beam can be focused to a 0.1µm
spot size, every 0.1µm spot within in a 5" × 5" plate of HEBS-glass
can acquire or reproduce a transmittance value that is required or assigned
by a mask user or a mask designer. HEBS-glass masks are capable of more than
500 gray levels. The minimum width of a gray level is 0.1µm.
HEBS-glass fabrication and consequent electron beam
exposure eliminate alignment errors, providing economical mask fabrication.
Also, the direct e-beam writing on the low expansion silica glass eliminates
chrome, resist and process chemicals for a zero-waste technique.
Canyon Materials, Inc. offers the service of making
custom HEBS-glass gray level masks to customers specifications. These gray-level
masks enable mass fabrication of 3-D microstructures and are employed in
several fields of micro technology. These fields include diffractive and
holographic devices, micro-optics and micro-mechanics,
integrated optics, and optical